Substrate Level Measurement
Understanding and measuring plasma-surface interactions is essential for a range of applications, including plasma etching in microelectronics, plasma deposition, and surface functionalization. The Impedans Retarding Field Energy Analyser (RFEA) systems measure the ion flux and ion energy distribution hitting a surface in real-time using an imitation substrate (holder plate) with integrated sensors. The holders can have up to 13 sensing elements, which is used to measure the uniformity of ion energy and ion flux at the substrate in industrial plasma applications. This is the industry standard for substrate level measurement of the ion energy distribution in fundamental research and plasma process development.
Measure key process parameters live
Measure the key parameters of process performance; ion flux, ion energy distribution function and deposition rate in real time.
Easy Installation
Our Retarding Field Energy Analyzers are modular and can be quickly and easily installed on chambers with various flange options.
Intuitive Software
Our software, which can be installed on any PC or laptop, is very intuitive and user friendly.
Substrate Options
Our RFEA sensors come with multiple substrate shapes and materials.
Replaceable Elements
All of our systems come with replaceable sensing elements (button probes) which can be easily replaced when maintenance is needed.
| Product |
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| Name | Semion | Semion pDC | Semion 3KeV | Quantum |
| Multi Sensor Holder Option | ||||
| Max RF Bias * @13.56MHz, reduces to 0.3kV @ 60MHz | 1kV pk-pk * | 0V | 3kV pk-pk * | 900V pk-pk * |
| Max DC Bias | -1940V | 400V pk-pk | -1500V | -1940V |
| Ion Energy | ||||
| Ion Flux | ||||
| Negative Ions | ||||
| Bias Voltage | With multimeter | With multimeter | ||
| Time-resolved Measurements | ||||
| Deposition Rate | ||||
| Aspect Ratio** ** Using capillary plates | ||||
| Read More | Read More | Read More | Read More |
