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Spatial Measurement for Plasma Uniformity

Suitable for different biasing conditions

Multiple Substrate Options and Replaceable Buttons

Semion RFEA

The Semion Retarding Field Energy Analyser (RFEA) system measures the ion flux and ion energy distribution hitting a surface in real-time using an imitation substrate (holder plate) with integrated sensors. The Semion Multi Sensor system can have up to 13 sensing elements distributed around the imitation substrate, which is primarily used to investigate the uniformity of ion energy and ion flux at the substrate in industrial plasma applications. A range of replaceable sensing elements with different signal sensitivities are available to probe a wide range of plasma ion current densities. This is the industry standard for substrate level measurement of the ion energy distribution, used in over 100 publications for fundamental research and plasma process development.

Max RF Bias: 1kV pk-pk *
Max DC Bias: -1940V

Measure key process parameters live

Measure the key parameters of process performance; ion flux and ion energy distribution function.

Spatial Measurement for Plasma Uniformity

Options for multi sensor holder substrates that allow the user to monitor plasma uniformity.

Substrate Options

Our RFEA sensors come with multiple substrate shapes and materials.The sensing elements and holder substrates are available in anodised aluminium, bare aluminium or stainless-steel options. Holders with different shapes and designs available upon request.

Replaceable Elements

Our RFEA systems have a range of replaceable sensing elements (button probes) with different signal sensitivities to probe a wide range of plasma ion current densities. They also allow for a range of pressures meaning a single system can be used for multiple plasma densities and pressure ranges.

Easy Installation

Our Semion systems are modular and can be quickly and easily installed on chambers with various flange options.

Intuitive Software

Our software, which can be installed on any PC or laptop, is very intuitive and user friendly.
The system will automatically calculate the IEDF results and in the case of a multi sensor Semion system the software will generate contour maps of energy and flux over the wafer area.

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Product resources

Delve into our comprehensive collection of resources tailored specifically for this product. From user manuals to video tutorials and case studies, explore everything you need to optimize your experience and maximize the potential of our innovative solution

Product Name Part Number Description
Semion Single Electronics Unit 02-0121-03 Compatible with single holders only Request info
Semion Multi Electronics Unit 02-0122-03 Compatible for all holders Request info
Semion Single Feedthrough 02-0117-03 Compatible with single holders only Request info
Semion Multi Feedthrough 02-0118-03 Compatible for all holders Request info
50mm Single Holder 02-0132-01 Single Holders also available up to 300mm Request info
70mm Single Holder 02-0399-01 1 sensing element mounting holes available Request info
150mm Multi Holder 02-0423-01 7 sensing elements Request info
200mm Multi Holder 02-0435-01 9 sensing elements Request info
300mm Multi Holder 02-0447-01 13 sensing elements Request info
450mm Multi Holder 02-0450-01 13 sensing elements Request info
Low Density 02-0333-01 0.001 to 3 Am-2 Request info
Standard Density 02-0007-05 0.01 to 50 Am-2 Request info
High Density 02-0336-01 0.1 to 700 Am-2 Request info
Sensing Elements (Button probes) 02-0133-01 Standard Density Request info

Applications notes

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